The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2023

Filed:

Mar. 13, 2019
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Yohei Yuda, Tokyo, JP;

Tatsuro Watahiki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/24 (2006.01); H01L 29/06 (2006.01); H01L 29/40 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/872 (2006.01);
U.S. Cl.
CPC ...
H01L 29/247 (2013.01); H01L 29/0619 (2013.01); H01L 29/402 (2013.01); H01L 29/66969 (2013.01); H01L 29/78 (2013.01); H01L 29/872 (2013.01); H01L 29/242 (2013.01);
Abstract

An object is to provide a technology that can enhance electrical characteristics of a semiconductor device. A semiconductor device is a semiconductor device provided with a semiconductor element. The semiconductor device includes: an n-type single-crystal gallium oxide layer including a first main surface; an electrode disposed on the first main surface of the n-type single-crystal gallium oxide layer or above the first main surface, the electrode being an electrode of the semiconductor element; a p-type oxide semiconductor layer disposed between the n-type single-crystal gallium oxide layer and the electrode; and an amorphous gallium oxide layer disposed between the n-type single-crystal gallium oxide layer and the p-type oxide semiconductor layer.


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