The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2023

Filed:

Jul. 29, 2020
Applicant:

Kioxia Corporation, Minato-ku, JP;

Inventors:

Yuji Hashimoto, Kuwana, JP;

Shinsuke Muraki, Kuwana, JP;

Hiroaki Yamada, Yokkaichi, JP;

Assignee:

Kioxia Corporation, Minato-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/08 (2006.01); B08B 13/00 (2006.01); B08B 3/10 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67126 (2013.01); B08B 3/08 (2013.01); B08B 3/106 (2013.01); B08B 13/00 (2013.01); H01L 21/6708 (2013.01); H01L 21/67051 (2013.01); H01L 21/67242 (2013.01); H01L 21/67248 (2013.01); B08B 2203/007 (2013.01); H01L 21/67017 (2013.01); H01L 21/67086 (2013.01); H01L 21/67253 (2013.01);
Abstract

According to one embodiment, a semiconductor manufacturing device includes a chemical solution preparation tank configured to prepare a solution; a chamber configured to discharge the chemical solution prepared at the chemical solution preparation tank to a substrate; a pressure sensor configured to measure a pressure inside the chemical solution preparation tank; and a variable opening valve arranged between the chemical solution preparation tank and an exhaust pipe.


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