The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2023

Filed:

Feb. 01, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Yan Rozenzon, San Carlos, CA (US);

Kyle Tantiwong, Livermore, CA (US);

Imad Yousif, San Jose, CA (US);

Vladimir Knyazik, Santa Clara, CA (US);

Bojenna Keating, Palo Alto, CA (US);

Samer Banna, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3244 (2013.01); C23C 16/4558 (2013.01); C23C 16/45561 (2013.01); C23C 16/45578 (2013.01); H01J 37/32082 (2013.01);
Abstract

A gas distribution hub for a plasma chamber. The hub has a nozzle including a plurality of inner gas injection passage and a plurality of outer gas injection passages. The first plurality of gas injection passages are angularly spaced-apart arcuate channels at a first radial distance from a center of the hub, and the second plurality of gas injection passages are angularly spaced apart arcuate channels at a different second radial distance from the center of the hub.


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