The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2023
Filed:
Aug. 24, 2020
Samsung Electronics Co., Ltd., Suwon-si, KR;
Kisung Kim, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method of verifying optical proximity effect correction includes generating a design pattern layout including a target pattern, generating a correction pattern layout from the design pattern layout by performing optical proximity effect correction, generating a contour image including an image pattern using the correction pattern layout, detecting a defect pattern from the image pattern of the contour image, and correcting the correction pattern layout using data of the defect pattern. Detecting the defect pattern includes acquiring position data of a center of gravity of the target pattern, acquiring position data of a center of gravity of the image pattern, and determining whether the image pattern is a defect pattern by comparing a defect pattern detection reference with a distance between the center of gravity of the target pattern and the center of gravity of the image pattern.