The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2023

Filed:

Jul. 25, 2019
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Vinayakaraddy Gulabal, Yadgir, IN;

Ravi Vellanki, San Jose, CA (US);

Gary B. Lind, Penn Valley, CA (US);

Michael Rumer, Santa Clara, CA (US);

Manjunath Satyadevan, Bangalore, IN;

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); C23C 16/02 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4583 (2013.01); C23C 16/0209 (2013.01); C23C 16/0254 (2013.01); C23C 16/45525 (2013.01);
Abstract

A heat shield structure for a substrate support in a substrate processing system includes an outer shield configured to surround a stem of the substrate support. The outer shield is further configured to define an inner volume between the outer shield and an upper portion of the stem and a lower surface of the substrate support and a vertical channel between the outer shield and a lower portion of the stem of the substrate support. The outer shield includes a cylindrical portion, a first lateral portion extending radially outward from the cylindrical portion, an angled portion extending radially outward and upward from the first lateral portion, and a second lateral portion extending radially outward from the angled portion.


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