The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2023

Filed:

Jul. 13, 2017
Applicant:

Uchicago Argonne, Llc, Chicago, IL (US);

Inventors:

Elena Shevchenko, Riverside, IL (US);

Diana Berman, Lemont, IL (US);

Supratik Guha, Lemont, IL (US);

Assignee:

UCHICAGO ARGONNE, LLC, Chicago, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/455 (2006.01); C23C 16/56 (2006.01); G02B 1/111 (2015.01); C23C 16/04 (2006.01); G02B 1/118 (2015.01);
U.S. Cl.
CPC ...
C23C 16/40 (2013.01); C23C 16/04 (2013.01); C23C 16/045 (2013.01); C23C 16/403 (2013.01); C23C 16/405 (2013.01); C23C 16/45525 (2013.01); C23C 16/45527 (2013.01); C23C 16/45555 (2013.01); C23C 16/56 (2013.01); G02B 1/111 (2013.01); G02B 1/118 (2013.01); G02B 2207/107 (2013.01);
Abstract

The disclosure relates to a method for forming a low refractive index layer on a substrate. The method generally includes (a) applying a block copolymer layer on a substrate, the block copolymer including a polar polymeric block and a non-polar polymeric block; (b) swelling the block copolymer layer with a solvent to increase the block copolymer layer thickness; (c) depositing a metal oxide or metalloid oxide layer on polar polymeric blocks of the block copolymer layer; and (d) removing the block copolymer layer from the substrate, thereby forming a porous metal oxide or metalloid oxide layer on the substrate.


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