The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2023
Filed:
Apr. 15, 2022
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Ki Woong Kim, Hwaseong-si, KR;
Hyeon Woo Seo, Suwon-si, KR;
Hee Ju Shin, Seoul, KR;
Se Chung Oh, Yongin-si, KR;
Hyun Cho, Changwon-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/35 (2006.01); H01J 37/32 (2006.01); C23C 14/08 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3464 (2013.01); C23C 14/08 (2013.01); C23C 14/352 (2013.01); H01J 37/32082 (2013.01); H01J 37/32155 (2013.01); H01J 37/32715 (2013.01); H01J 37/3417 (2013.01);
Abstract
A sputtering apparatus including a chamber, a stage inside the chamber and configured to receive a substrate thereon, a first sputter gun configured to provide a sputtering source to an inside of the chamber, a first RF source configured to provide a first power having a first frequency to the first sputter gun, and a second RF source configured to provide a second power having a second frequency to the first sputter gun, the second frequency being lower than the first frequency may be provided.