The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2023

Filed:

Feb. 16, 2021
Applicant:

United States of America As Represented BY the Administrator of Nasa, Washington, DC (US);

Inventors:

Donald L. Thomsen, III, Yorktown, VA (US);

Sankara N. Sankaran, Yorktown, VA (US);

Joel A. Alexa, Hampton, VA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B64G 1/58 (2006.01); B32B 15/01 (2006.01); C23C 4/134 (2016.01); C23C 4/137 (2016.01); C22C 14/00 (2006.01); B64G 1/54 (2006.01); C23C 4/08 (2016.01); C23C 28/02 (2006.01); G21F 1/12 (2006.01);
U.S. Cl.
CPC ...
B64G 1/58 (2013.01); B32B 15/017 (2013.01); B64G 1/543 (2013.01); B64G 1/546 (2013.01); C22C 14/00 (2013.01); C23C 4/08 (2013.01); C23C 4/134 (2016.01); C23C 4/137 (2016.01); C23C 28/028 (2013.01); G21F 1/12 (2013.01); G21F 1/125 (2013.01);
Abstract

In some aspects, this disclosure relates to improved Z-grade materials, such as those used for shielding, systems incorporating such materials, and processes for making such Z-grade materials. In some examples, the Z-grade material includes a diffusion zone including mixed metallic alloy material with both a high atomic number material and a lower atomic number material. In certain examples, a process for making Z-grade material includes combining a high atomic number material and a low atomic number material, and bonding the high atomic number material and the low atomic number together using diffusion bonding. The processes may include vacuum pressing material at an elevated temperature, such as a temperature near a softening or melting point of the low atomic number material. In another aspect, systems such as a vault or an electronic enclosure are disclosed, where one or more surfaces of Z-grade material make up part or all of the vault/enclosure.


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