The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2023
Filed:
Dec. 08, 2021
The Johns Hopkins University, Baltimore, MD (US);
Koninklijke Philips Nv., Eindhoven, NL;
Joseph Webster Stayman, Baltimore, MD (US);
Aswin John Mathews, Baltimore, MD (US);
Reuven Levinson, Haifa, IL;
THE JOHNS HOPKINS UNIVERSITY, Baltimore, MD (US);
Abstract
The present invention is directed to multiple aperture devices (MADs) for beam shaping in x-ray imaging. Two or more of these binary filters can be placed in an x-ray beam in series to permit a large number of x-ray fluence profiles. However, the relationship between particular MAD designs and the achievable fluence patterns is complex. The present invention includes mathematical and physical models that are used within an optimization framework to find optimal MAD designs. Specifically, given a set of target fluence patterns, the present invention finds, for example, a dual MAD design that is a 'best fit' in generating the desired fluence patterns. This process provides a solution for both the design of MAD filters as well as the control actuation that is required (relative motion between MADs) that needs to be specified as part of the operation of a MAD-based fluence field modulation system.