The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2023

Filed:

Jun. 05, 2020
Applicant:

Hexarmor, Limited Partnership, Grand Rapids, MI (US);

Inventor:

Nicholas R. Waterloo, Grand Rapids, MI (US);

Assignee:

HexArmor, Limited Partnership, Grand Rapids, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A41D 19/00 (2006.01); A41D 19/015 (2006.01); B33Y 70/00 (2020.01); B33Y 10/00 (2015.01); B33Y 80/00 (2015.01);
U.S. Cl.
CPC ...
A41D 19/01523 (2013.01); A41D 19/0006 (2013.01); A41D 19/0058 (2013.01); A41D 19/01558 (2013.01); A41D 19/0082 (2013.01); B33Y 10/00 (2014.12); B33Y 70/00 (2014.12); B33Y 80/00 (2014.12);
Abstract

A protective garment includes a base layer formed from a flexible material. A grip layer is disposed on a first side of the base layer. The grip layer has an increased coefficient of friction compared to the base layer. A protective layer is disposed on a second side of the base layer. The protective layer includes a three-dimensional matrix that has a plurality of columns that extend in a first direction and a plurality of rows stacked on the plurality of columns that extend in a second direction. The plurality of rows and the plurality of columns define a plurality of voids.


Find Patent Forward Citations

Waterloo, Nicholas. (2023). 3d printed impact resistant glove (U.S. Patent No. 11723422). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11723422

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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