The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2023

Filed:

Dec. 06, 2019
Applicant:

Suzhou Oriental Semiconductor Co., Ltd., Jiangsu, CN;

Inventors:

Yi Gong, Jiangsu, CN;

Lei Liu, Jiangsu, CN;

Wei Liu, Jiangsu, CN;

Yuanlin Yuan, Jiangsu, CN;

Xin Wang, Jiangsu, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/739 (2006.01); H01L 27/06 (2006.01); H01L 29/08 (2006.01); H01L 29/788 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7395 (2013.01); H01L 27/0629 (2013.01); H01L 29/0821 (2013.01); H01L 29/7889 (2013.01);
Abstract

Provided is an insulated gate bipolar transistor power device. The IGBT power device includes a gate dielectric layer located above the two p-type body regions and the n-type drift region between the two p-type body regions, an n-type floating gate located above the gate dielectric layer; a gate located above the gate dielectric layer and the n-type floating gate; an insulating dielectric layer between the gate and the n-type floating gate; a first opening located in the gate dielectric layer, where the n-type floating gate is in contact with one of the two p-type body regions through the first opening to form a p-n junction diode; and a second opening located in the gate dielectric layer, where the n-type floating gate is in contact with the other of the two p-type body regions through the second opening to form the p-n junction diode.


Find Patent Forward Citations

Loading…