The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2023
Filed:
Jul. 22, 2020
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventor:
Hiroshi Kurosawa, Utsunomiya, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/308 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01); H01L 21/027 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3086 (2013.01); G03F 7/0002 (2013.01); G03F 7/70625 (2013.01); H01L 21/0274 (2013.01); H01L 22/12 (2013.01);
Abstract
An article manufacturing method includes a first formation step of forming a focus compensation film on a substrate, a second formation step of forming a resist layer on the focus compensation film, and a transfer step of transferring a pattern of an original to the resist layer using an exposure apparatus. In the first formation step, the focus compensation film is formed such that the focus compensation film has a top surface shape corresponding to an image surface shape of the exposure apparatus.