The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2023

Filed:

Sep. 16, 2019
Applicant:

The Regents of the University of Colorado, Denver, CO (US);

Inventors:

David Miller, Boulder, CO (US);

Robert R. McLeod, Boulder, CO (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 1/115 (2015.01); C08L 83/04 (2006.01); C08K 3/04 (2006.01); G02B 5/02 (2006.01); G02B 26/08 (2006.01); G02B 5/22 (2006.01); B82Y 20/00 (2011.01);
U.S. Cl.
CPC ...
G02B 1/115 (2013.01); C08K 3/04 (2013.01); C08L 83/04 (2013.01); G02B 5/0226 (2013.01); G02B 5/0294 (2013.01); G02B 5/223 (2013.01); G02B 26/0875 (2013.01); B82Y 20/00 (2013.01);
Abstract

Various embodiments of the present technology generally relate to reflection suppressors. More specifically, some embodiments use elastomeric materials doped with optical absorbers for temporary suppression of Fresnel reflections for multiple substrates spanning wide spectral and angular bandwidth. The refractive index of the elastomer can be tuned to match a substrate and thereby minimize reflection. Some embodiments can use the addition of different absorptive dopants to allow for either broadband or wavelength-selective reflection suppression. As performance is limited only by index mismatch, both spectral and angular performance significantly exceed that of anti-reflection coatings. After use, these light traps may be removed and reused without damaging the substrate. These films have uses in spectroscopic ellipsometry, holography, and lithography.


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