The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2023

Filed:

Aug. 20, 2021
Applicant:

Huawei Technologies Co., Ltd., Shenzhen, CN;

Inventors:

Jianliang Wang, Dongguan, CN;

Liujun Zou, Shenzhen, CN;

Jian Shi, Shanghai, CN;

Zhiguo Zhang, Wuhan, CN;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F01D 1/02 (2006.01); F04D 29/44 (2006.01); F04D 17/16 (2006.01); F04D 29/42 (2006.01); G06F 1/20 (2006.01);
U.S. Cl.
CPC ...
F04D 29/441 (2013.01); F04D 17/16 (2013.01); F04D 29/4226 (2013.01); G06F 1/203 (2013.01);
Abstract

A centrifugal fan includes a housing configured to accommodate an impeller. The impeller rotates relative to the housing. A flow channel that cooperates with the impeller is disposed in the housing. The flow channel includes a pressurization area, in which a static pressure and a flow velocity of an air flow are gradually increased along a rotation direction of the impeller. However, an air inlet is disposed on the housing, and there is a specific gap between the impeller and the air inlet. As a result, when air flows through the pressurization area, there is a specific amount of leakage through the gap. Therefore, an air baffle ring is disposed in the centrifugal fan provided in this application.


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