The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2023
Filed:
Oct. 22, 2018
Sumco Corporation, Tokyo, JP;
Mami Kubota, Tokyo, JP;
Keiichi Takanashi, Tokyo, JP;
SUMCO CORPORATION, Tokyo, JP;
Abstract
Provided is a double-side polishing apparatus and a double-side polishing method which make it possible to terminate double-side polishing with timing allowing a work having been polished to have a target shape. A computing unitperforms a step of grouping the data of thicknesses measured using work thickness measuring deviceson a work basis; a step of extracting shape components of each work from the thickness data; a step of identifying a position of each of the shape components in the work radial direction; a step of computing a shape distribution of the work from the identified position ; a step of obtaining a shape index of the work from the computed shape distribution; and a step of determining timing of termination of the double-side polishing based on the obtained shape index, thus timing of termination of the double-side polishing is determined.