The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2023

Filed:

Jul. 29, 2021
Applicant:

Nanopass Technologies Ltd., Ness Ziona, IL;

Inventors:

Gal Admati, Kibbutz Dorot, IL;

Yotam Levin, Ness Ziona, IL;

Yoav Hamisha, Mazkeret Batya, IL;

Assignee:

NANOPASS TECHNOLOGIES LTD., Ness Ziona, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61M 37/00 (2006.01);
U.S. Cl.
CPC ...
A61M 37/0015 (2013.01); A61M 2037/003 (2013.01); A61M 2037/0053 (2013.01); A61M 2037/0061 (2013.01); A61M 2207/00 (2013.01);
Abstract

A microneedle structure has one or more microneedles () projecting from the major surface () of a substrate (). The microneedle has a penetrating tip () formed at an intersection between upright surfaces () and an inclined surface () corresponding to a (1 1 1) crystallographic plane. The microneedle has an expanding portion bounded by a continuation of the upright surfaces () and inclined surface (), and a constant cross-section portion bounded by a continuation of the upright surfaces and a slicing plane () extending from an edge () of inclined surface () towards, and perpendicular to, major surface () of the substrate. A width W of inclined surface () increases monotonically from penetrating tip () to edge ().


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