The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2023

Filed:

Dec. 12, 2019
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Kunihiko Asada, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B29C 33/42 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 33/424 (2013.01); G03F 7/0022 (2013.01); B29C 2033/426 (2013.01);
Abstract

Imprint apparatus brings pattern region of mold into contact with imprint material on shot region of substrate, aligns the shot region and the pattern region with each other, and cures the imprint material. The apparatus includes light irradiator which irradiates the imprint material with light. In state that the imprint material on the shot region and the pattern region are in contact and the pattern region is flat, the light irradiator performs preliminary exposure of irradiating the imprint material with the light to increase viscosity of the imprint material. In the preliminary exposure, the light irradiator irradiates the imprint material with the light under illuminance distribution determined such that illuminance in contact beginning region where the imprint material and the pattern region begin to contact is lower than illuminance in certain region different from the contact beginning region.


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