The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2023

Filed:

Jun. 26, 2020
Applicant:

SK Microworks Co., Ltd., Gyeonggi-do, KR;

Inventors:

Jung Hee Ki, Gyeonggi-do, KR;

Sunhwan Kim, Incheon, KR;

Dae Seong Oh, Seoul, KR;

Jin Woo Lee, Seoul, KR;

Sang Hun Choi, Seoul, KR;

Han Jun Kim, Gyeonggi-do, KR;

Heung Sik Kim, Seoul, KR;

Assignee:

SK MICROWORKS CO., LTD., Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 5/18 (2006.01);
U.S. Cl.
CPC ...
C08J 5/18 (2013.01); C08J 2377/00 (2013.01); C08J 2379/08 (2013.01);
Abstract

The polymer film according to an embodiment comprises at least one polymer resin selected from the group consisting of a polyamide-based resin, a polyimide-based resin, and a polyamide-imide-based resin, and has a haze of 0.6% or less and an in-plane retardation within a specific range for each wavelength band in the visible light region. The polymer film, which has an in-plane retardation within a specific range for each wavelength band in the visible light region, is excellent in transparency and optical properties, and it can remarkably reduce the rainbow phenomenon and improve the reflection appearance.


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