The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 25, 2023

Filed:

Mar. 18, 2019
Applicant:

Linde Gmbh, Pullach, DE;

Inventors:

Christoph Windmeier, Geretsried, DE;

Tobias Lautenschlager, Gröbenzell, DE;

Bernd Wunderlich, Starnberg, DE;

Assignee:

Linde GmbH, Pullach, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/20 (2020.01); G05B 19/418 (2006.01); G06F 111/06 (2020.01);
U.S. Cl.
CPC ...
G05B 19/4188 (2013.01); G05B 19/4183 (2013.01); G05B 19/41865 (2013.01); G05B 19/41885 (2013.01); G06F 30/20 (2020.01); G06F 2111/06 (2020.01);
Abstract

The present invention relates to a computer-implemented method for performing a chemical engineering process, in particular in an air separation plant or a natural gas plant, wherein a multiplicity of process simulations are performed simultaneously, in the course of each of which the process in the process plant is in each case simulated for a particular application case, wherein each application case is characterized by values of process plant variables and/or values of process parameters, wherein, in the multiplicity of process simulations, values for the process plant variables and/or for the process parameters are determined such that at least one predefined condition is met, wherein free values for process plant variables and/or process parameters are determined, and wherein dependent values for process plant variables and/or process parameters are determined from the free values for process plant variables and/or process parameters.


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