The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2023
Filed:
May. 18, 2020
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Daisuke Kori, Joetsu, JP;
Takashi Sawamura, Joetsu, JP;
Kenta Ishiwata, Joetsu, JP;
Takayoshi Nakahara, Joetsu, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
A composition for forming an organic film contains a polymer having a repeating unit shown by formula (1A) as a partial structure, and an organic solvent, where ARand ARrepresent a benzene ring or naphthalene ring optionally with a substituent; Wrepresents any in formula (1B), and the polymer optionally contains two or more kinds of W; Wrepresents a divalent organic group having 1 to 80 carbon atoms; Rrepresents a monovalent organic group having 1 to 10 carbon atoms and an unsaturated bond; and Rrepresents a monovalent organic group having 6 to 20 carbon atoms and one or more aromatic rings. This invention provides: an organic film composition which enables excellent film formability, high etching resistance, and excellent twisting resistance without impairing the resin-derived carbon content, and which contains less outgassing-causing sublimation component; a patterning process using the composition; and a polymer suitable for the composition.