The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2023
Filed:
Sep. 17, 2020
Applicant:
Meta Platforms Technologies, Llc, Menlo Park, CA (US);
Inventors:
Elliott Franke, Bellevue, WA (US);
Nihar Ranjan Mohanty, Snoqualmie, WA (US);
Ankit Vora, Bothell, WA (US);
Austin Lane, Sammamish, WA (US);
Matthew E. Colburn, Woodinville, WA (US);
Assignee:
META PLATFORMS TECHNOLOGIES, LLC, Menlo Park, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/09 (2006.01); G03F 7/11 (2006.01); G02B 27/01 (2006.01); G03F 7/12 (2006.01); F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0005 (2013.01); G02B 6/0016 (2013.01); G02B 6/0038 (2013.01); G02B 6/0065 (2013.01); G02B 27/0172 (2013.01); G03F 7/091 (2013.01); G03F 7/11 (2013.01); G03F 7/12 (2013.01); G02B 2027/0178 (2013.01);
Abstract
Gray-tone lithography techniques for controlling the thickness profile of an overcoat layer on a surface-relief grating that has a non-uniform grating parameter (e.g., depth, duty cycle, or period), compensating for the non-uniform etch rate in a large area, defining etch/block regions, and/or controlling the thickness of the grating layer.