The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2023
Filed:
Aug. 25, 2020
Seiko Epson Corporation, Tokyo, JP;
SEIKO EPSON CORPORATION, Tokyo, JP;
Abstract
A method of manufacturing an optical element including, a first step of, after affixing a hologram forming material to a glass substrate having a marking portion, performing interference exposure on the hologram forming material, thereby forming a hologram layer at the glass substrate, and a second step of affixing the hologram layer peeled off from the glass substrate to a plastic substrate having a first alignment mark, wherein in the second step, the first alignment mark on the plastic substrate, and a second alignment mark formed at a position corresponding to the marking portion in the hologram layer during the interference exposure are used to implement positioning of the plastic substrate and the hologram layer.