The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2023
Filed:
Feb. 04, 2022
Applicant:
Tel Manufacturing and Engineering of America, Inc., Chaska, MN (US);
Inventors:
Kevin Siefering, Excelsior, MN (US);
Edward Hanzlik, Shorewood, MN (US);
Assignee:
TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC., Chaska, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 (2006.01); B08B 3/10 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
B08B 3/02 (2013.01); B08B 3/10 (2013.01); B08B 2203/007 (2013.01); B08B 2203/0229 (2013.01); H01L 21/02041 (2013.01); H01L 21/67051 (2013.01);
Abstract
The present invention provides techniques to more accurately control the process performance of treatments in which microelectronic substrates are treated by pressurized fluids that are sprayed onto the substrates in a vacuum process chamber control strategies are used that adjust mass flow rate responsive to pressure readings in order to hold the pressure of a pressurized feed constant. In these embodiments, the mass flow rate will tend to vary in order to maintain pressure uniformity.