The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2023

Filed:

Sep. 30, 2020
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventor:

Seokcheon Baek, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 43/27 (2023.01); H01L 23/522 (2006.01); H10B 41/10 (2023.01); H10B 41/27 (2023.01); H10B 43/10 (2023.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); H01L 23/5226 (2013.01); H10B 41/10 (2023.02); H10B 41/27 (2023.02); H10B 43/10 (2023.02);
Abstract

A vertical memory device includes first horizontal gate electrodes disposed on a substrate and spaced apart from each other in a first direction that is substantially perpendicular to an upper surface of the substrate. Each of the first horizontal gate electrodes extends in a second direction that is substantially parallel to the upper surface of the substrate. A vertical channel extends through the first horizontal gate electrodes in the first direction. A charge storage structure is disposed between the vertical channel and each of the first horizontal gate electrodes. A first vertical gate electrode extends through the first horizontal gate electrodes in the first direction. The first vertical gate electrode is electrically insulated from the first horizontal gate electrodes. A first horizontal channel is disposed at a portion of each of the first horizontal gate electrodes adjacent to the first vertical gate electrode.


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