The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2023
Filed:
Sep. 21, 2018
Duke University, Durham, NC (US);
David R. Smith, Durham, NC (US);
Guillermo Sapiro, Durham, NC (US);
Daniel L. Marks, Durham, NC (US);
Patrick Bowen, Durham, NC (US);
Roberto Zecca, Durham, NC (US);
Okan Yurduseven, Altadena, CA (US);
Jonah N. Gollub, Durham, NC (US);
Other;
Abstract
Systems and methods for designing, optimizing, patterning, forming, and manufacturing symphotic structures are described herein. A symphotic structure may be formed by identifying a continuous refractive index distribution calculated to convert each of a plurality of input reference waves to a corresponding plurality of output object waves. The continuous refractive index distribution can be modeled as a plurality of subwavelength voxels. The system can calculate a symphotic pattern as a three-dimensional array of discrete dipole values to functionally approximate the subwavelength voxels. A symphotic structure may be formed with a volumetric distribution of dipole structures. A dipole value, such as a dipole moment (direction and magnitude) of each dipole is selected for the volumetric distribution to convert a plurality of input reference waves to a target plurality of output object waves.