The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2023
Filed:
May. 04, 2022
GE Precision Healthcare Llc, Wauwatosa, WI (US);
Hao Shen, Waukesha, WI (US);
GE Precision Healthcare LLC, Wauwatosa, WI (US);
Abstract
A method to compensate for chemical shift displacement includes, prior to applying an imaging pulse sequence to acquire MRI data of a subject, applying a first saturation pulse within a slice location of an imaging volume of the subject in which the MRI data is to be acquired, wherein the first saturation pulse results in a first chemical shift displacement between water and fat in a first spatial saturation band. The method also includes, prior to applying the imaging pulse sequence, subsequently applying a second saturation pulse within the slice location, wherein the second saturation pulse results in a second chemical displacement between the water and the fat in a second spatial saturation band that results in a final spatial saturation band being free of chemical shift displacement after application of the second saturation pulse, the second chemical shift displacement being different from the first chemical shift displacement.