The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2023

Filed:

Sep. 23, 2022
Applicant:

Monde Wireless Inc., Goleta, CA (US);

Inventor:

Brian Romanczyk, Goleta, CA (US);

Assignee:

MONDE Wireless Inc., Goleta, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/778 (2006.01); H01L 29/20 (2006.01); H01L 29/66 (2006.01); H01L 29/423 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 29/2003 (2013.01); H01L 21/28587 (2013.01); H01L 29/42376 (2013.01); H01L 29/66462 (2013.01); H01L 29/7782 (2013.01); H01L 29/7785 (2013.01); H01L 29/7786 (2013.01);
Abstract

An N-polar III-N high-electron mobility transistor device can include a III-N channel layer over an N-face of a III-N backbarrier, wherein a compositional difference between the channel layer and the backbarrier causes a 2DEG channel to be induced in the III-N channel layer adjacent to the interface between the III-N channel layer and the backbarrier. The device can further include a p-type III-N layer over the III-N channel layer and a thick III-N cap layer over the p-type III-N layer. The III-N cap layer can cause an increase in the charge density of the 2DEG channel directly below the cap layer, and the p-type III-N layer can serve to prevent a parasitic 2DEG from forming in the III-N cap layer.


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