The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2023
Filed:
May. 11, 2020
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Kyungsik Shin, Asan-si, KR;
Jung-Hyun Lee, Cheonan-si, KR;
Jinki Shin, Busan, KR;
Seo Jung Park, Goyang-si, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6715 (2013.01); H01L 21/67109 (2013.01); H01L 21/68707 (2013.01); H01L 21/68742 (2013.01);
Abstract
An apparatus for treating a substrate includes a chamber having a treating space formed therein, a substrate support unit that supports the substrate in the treating space, a plate that is located to face the substrate support unit in the treating space and that has a plurality of holes formed therein, a gas supply unit that supplies gas into the treating space through the holes, and a gas exhaust unit that exhausts the gas in the treating space through the holes.