The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2023
Filed:
Feb. 04, 2019
Myntra Designs Private Limited, Bangalore, IN;
Myntra Designs Private Limited, Bangalore, IN;
Abstract
A system for size and fitting recommendation for fashion products is provided. The system includes a memory having computer readable instructions stored therein. The system further includes a processor configured to access purchase and content data of one or more fashion products purchased by a plurality of users. The processor is configured to generate an observable feature vector for each of the one or more fashion products. The observable feature vector is generated based upon observable features data corresponding to each of the one or more fashion product. The processor is further configured to aggregate the observable feature vectors of the fashion products purchased by each user to compute an observable user vector for the respective user. In addition, the processor is further configured to generate a latent feature vector for each of the one or more fashion products. The latent feature vector is generated based upon latent features data corresponding to each fashion product. Furthermore, the processor is configured to aggregate the latent feature vectors of fashion products purchased by each user to compute a latent user vector for the respective user. Moreover, the processor further configured to generate size and fitting recommendations of fashion products for each user based upon the observable feature vector, the observable user vector, latent feature vector and the latent user vector.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile