The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2023
Filed:
Jun. 10, 2019
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, KR;
Inventors:
Shinhyo Bae, Suwon-si, KR;
Soonhyung Kwon, Suwon-si, KR;
Hyeon Park, Suwon-si, KR;
Jaeyeol Baek, Suwon-si, KR;
Beomjun Joo, Suwon-si, KR;
Yoojeong Choi, Suwon-si, KR;
Assignee:
SAMSUNG SDI CO., LTD., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); G03F 7/11 (2006.01); C08G 18/02 (2006.01); C08L 71/00 (2006.01); G03F 7/36 (2006.01); G03F 7/004 (2006.01); C08L 75/04 (2006.01); C08L 61/06 (2006.01); C08L 63/00 (2006.01); C08L 61/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); C08G 18/022 (2013.01); C08L 61/06 (2013.01); C08L 61/28 (2013.01); C08L 63/00 (2013.01); C08L 71/00 (2013.01); C08L 75/04 (2013.01); G03F 7/0041 (2013.01); G03F 7/0045 (2013.01); G03F 7/094 (2013.01); G03F 7/36 (2013.01);
Abstract
A resist underlayer composition and a method of forming patterns using a resist underlayer composition, the resist underlayer composition including a polymer, the polymer including a structural unit that is a reaction product of an isocyanurate compound, the isocyanurate compound having at least one thiol group thereon, and a solvent.