The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2023
Filed:
Jul. 15, 2020
Applicant:
Raytheon Company, Waltham, MA (US);
Inventors:
John P. Schaefer, Plano, TX (US);
Paul Gasloli, Richardson, TX (US);
Assignee:
RAYTHEON COMPANY, Waltham, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); B33Y 70/10 (2020.01); B33Y 80/00 (2015.01); B32B 15/20 (2006.01); B32B 18/00 (2006.01); B32B 7/023 (2019.01); B32B 7/12 (2006.01); B33Y 40/20 (2020.01); B32B 15/01 (2006.01); C22C 21/02 (2006.01); B32B 38/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/0808 (2013.01); B32B 7/023 (2019.01); B32B 7/12 (2013.01); B32B 15/017 (2013.01); B32B 15/20 (2013.01); B32B 18/00 (2013.01); B33Y 40/20 (2020.01); B33Y 70/10 (2020.01); B33Y 80/00 (2014.12); C22C 21/02 (2013.01); B32B 2038/0064 (2013.01); B32B 2307/416 (2013.01); B32B 2307/536 (2013.01); B32B 2310/08 (2013.01); B32B 2551/08 (2013.01);
Abstract
A mirrored apparatus includes a substrate having a surface and including an additive manufactured aluminum and about 2 to about 30 weight % (wt. %) silicon. The mirrored apparatus also includes a finish layer arranged directly on the surface of the substrate. The finish layer includes a polished surface opposite the substrate. The mirrored apparatus further includes a reflective layer arranged on the polished surface of the finish layer.