The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2023
Filed:
Oct. 15, 2020
Massachusetts Institute of Technology, Cambridge, MA (US);
Crystal Elaine Owens, River Falls, WI (US);
Gareth H. McKinley, Acton, MA (US);
Anastasios John Hart, Waban, MA (US);
MASSACHUSETTS INSTITUTE OF TECHNOLOGY, Cambridge, MA (US);
Abstract
The present disclosure is directed to rheometric fixtures for making rheological measurements of yield stress fluids. In some embodiments, the fixture can be an improvement of a typical vane by having the ability to create a more homogeneous shear profile in a test material, e.g., a yield stress fluid. These vane fixtures having fractal-like cross-sectional structures enable robust rheological measurements of the properties of yield stress fluids due to several outer contact edges that lead to increased kinematic homogeneity at the point of yielding and beyond. The branching structure of the fractal-like fixtures can alter the shape of a wetted perimeter of the fixture while minimizing an area thereof to allow the fixture to be inserted into fluids with less disturbance. In some embodiments, a cup with a ribbed inner surface can be used to hold the sample fluid and disassembles for ease of cleaning following completion of the measurement.