The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2023

Filed:

Aug. 27, 2020
Applicant:

Landmark Graphics Corporation, Houston, TX (US);

Inventors:

Manish K. Mittal, Cypress, TX (US);

Robello Samuel, Cypress, TX (US);

Assignee:

Landmark Graphics Corporation, Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
E21B 44/00 (2006.01); E21B 44/08 (2006.01); E21B 47/003 (2012.01); E21B 49/00 (2006.01); E21B 45/00 (2006.01); G06Q 10/0639 (2023.01);
U.S. Cl.
CPC ...
E21B 44/08 (2013.01); E21B 44/00 (2013.01); E21B 45/00 (2013.01); E21B 47/003 (2020.05); E21B 49/003 (2013.01); G06Q 10/06393 (2013.01);
Abstract

A system is described for calculating and outputting micro invisible lost time (MILT). The system may include a processor and a non-transitory computer-readable medium comprising instructions that are executable by the processor to cause the processor to perform various operations. Time-stamp data that includes values of drilling parameters may be received about a drilling operation, and the values of drilling parameters may be classified into a rig state that includes rig activities. For each rig activity, an actual completion time may be determined and compared to an expected completion time for determining a deviation. At least one deviated activity, in which the deviation is greater than a threshold, may be determined. Deviations may be combined into MILT that can be output for controlling the drilling operation.


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