The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2023
Filed:
Dec. 18, 2019
Depuy Synthes Products, Inc., Raynham, MA (US);
Dominique Messerli, Bristol, RI (US);
Ryan T. Walsh, Downingtown, PA (US);
Brandon L. Randall, Duxbury, MA (US);
David E. Evans, Atlanta, GA (US);
Jacqueline Myer, Pottstown, PA (US);
David Koch, North Logan, UT (US);
Markus Hunziker, Aargau, CH;
DEPUY SYNTHES PRODUCTS, INC., Raynham, MA (US);
Abstract
An intervertebral spacer implant () is provided with a retention mechanism () to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer () and a plate (), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes () in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.