The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2023

Filed:

Jul. 01, 2021
Applicant:

Sharp Kabushiki Kaisha, Sakai, JP;

Inventors:

Tohru Daitoh, Sakai, JP;

Masahiko Suzuki, Sakai, JP;

Setsuji Nishimiya, Sakai, JP;

Kengo Hara, Sakai, JP;

Hitoshi Takahata, Sakai, JP;

Tetsuo Kikuchi, Sakai, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1225 (2013.01); H01L 27/127 (2013.01); H01L 27/1251 (2013.01);
Abstract

An active matrix substrate includes a first TFT and a second TFT, each of TFTs includes an oxide semiconductor layer and a gate electrode arranged on the oxide semiconductor layer with a gate insulating layer therebetween, in which in the first TFT, in the oxide semiconductor layer, in at least a part of a first region covered with the gate electrode with the gate insulating layer interposed therebetween, a layered structure including a high mobility oxide semiconductor film having a relatively high mobility and a low mobility oxide semiconductor film placed on the high mobility oxide semiconductor film and having a lower mobility than the high mobility oxide semiconductor film is provided, and in the second TFT, in a first region of the oxide semiconductor layer, throughout, of the high mobility oxide semiconductor film and the low mobility oxide semiconductor film, one oxide semiconductor film is provided, and the other oxide semiconductor film is not provided.


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