The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2023
Filed:
Jun. 08, 2021
Sony Group Corporation, Tokyo, JP;
Sony Corporation of America, New York, NY (US);
Chen Fu, San Jose, CA (US);
Mohammad Gharavi-Alkhansari, San Jose, CA (US);
SONY GROUP CORPORATION, Tokyo, JP;
SONY CORPORATION OF AMERICA, New York, NY (US);
Abstract
A system and method for three-dimensional (3D) microgeometry and reflectance modeling is provided. The system receives images comprising a first set of images of a face and a second set of images of the face. The faces in the first set of images and the second set of images are exposed to omni-directional lighting and directional lighting, respectively. The system generates a 3D face mesh based on the received images and executes a set of skin-reflectance modeling operations by using the generated 3D face mesh and the second set of images, to estimate a set of texture maps for the face. Based on the estimated set of texture maps, the system texturizes the generated 3D face mesh. The texturization includes an operation in which texture information, including microgeometry skin details and skin reflectance details, of the estimated set of texture maps is mapped onto the generated 3D face mesh.