The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2023
Filed:
Nov. 15, 2021
Applicant:
Reservoir Labs, Inc., New York, NY (US);
Inventors:
Benoit J. Meister, New York, NY (US);
Adithya Dattatri, Newark, DE (US);
Assignee:
Reservoir Labs Inc., San Diego, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 8/41 (2018.01); G06N 3/08 (2023.01); G06F 8/71 (2018.01);
U.S. Cl.
CPC ...
G06F 8/43 (2013.01); G06F 8/71 (2013.01); G06N 3/08 (2013.01);
Abstract
An approach is presented to enhancing the optimization process in a polyhedral compiler by introducing compile-time versioning, i.e., the production of several versions of optimized code under varying assumptions on its run-time parameters. We illustrate this process by enabling versioning in the polyhedral processor placement pass. We propose an efficient code generation method and validate that versioning can be useful in a polyhedral compiler by performing benchmarking on a small set of deep learning layers defined for dynamically-sized tensors.