The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2023
Filed:
May. 24, 2018
Applicant:
Lawrence Livermore National Security, Llc, Livermore, CA (US);
Inventors:
Hoang T. Nguyen, Livermore, CA (US);
Jerald A. Britten, Clayton, CA (US);
Assignee:
LAWRENCE LIVERMORE NATIONAL SECURITY, LLC, Livermore, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); H01S 3/00 (2006.01); G02B 5/18 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3041 (2013.01); H01S 3/005 (2013.01); H01S 3/0057 (2013.01); G02B 5/1809 (2013.01);
Abstract
A system configuration that significantly improves the laser damage threshold of multi-layer dielectric gratings for lasers applications includes three main sections: 1) a laser module, 2) a TM polarization module, and 3) a multi-layer dielectric grating optimized for high efficiency operation with transverse magnetic polarized laser light.
Nguyen, Hoang. (2023). System and method for improving the laser damage threshold of multilayer dielectric gratings (U.S. Patent No. 11693167). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11693167
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile