The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2023

Filed:

Jun. 03, 2021
Applicant:

Schaeffler Technologies Ag & Co. KG, Herzogenaurach, DE;

Inventor:

Edward J. Wey, Waxhaw, NC (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01D 5/14 (2006.01); G01B 7/30 (2006.01); G01P 3/44 (2006.01); B60K 6/26 (2007.10);
U.S. Cl.
CPC ...
G01B 7/30 (2013.01); G01D 5/14 (2013.01); G01P 3/44 (2013.01); B60K 6/26 (2013.01); B60Y 2200/92 (2013.01); B60Y 2400/303 (2013.01);
Abstract

A rotational position sensor arrangement having first and second sensors positioned adjacent to an axial face of a target disc. The target disc has the axial face either one wave profile or radially spaced apart first and second wave profiles, having respectively, a first plurality of segments and a second plurality of segments, with each of the segments being formed with axially offset peaks and valleys which extend along radial lines. The valleys separate the segments, and the number of the first plurality of segments is different than the number of the second plurality of segments. The first and second sensors are located at different radial distances from the axis and signal a controller with data on a field variance due to a difference in at least one of a size or location of the one wave profile or the first and second wave profiles as they pass the first and second sensors in order to determine a rotational speed and/or position.


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