The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2023
Filed:
Jul. 08, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Alexander N. Lerner, San Jose, CA (US);
Roey Shaviv, Palo Alto, CA (US);
Satish Radhakrishnan, San Jose, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/24 (2006.01); C23C 14/04 (2006.01); C23C 14/50 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 14/24 (2013.01); C23C 14/042 (2013.01); C23C 14/505 (2013.01); C23C 16/45565 (2013.01);
Abstract
One or more embodiments described herein generally relate to methods and systems for forming films on substrates in semiconductor processes. In embodiments described herein, process chamber is provided that includes a lid plate having a plurality of cooling channels formed therein, a pedestal, the pedestal having a plurality of cooling channels formed therein, and a showerhead, wherein the showerhead comprises a plurality of segments and each segment is at least partially surrounded by a shield.