The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2023

Filed:

Jul. 29, 2021
Applicant:

Ajou University Industry-academic Cooperation Foundation, Suwon-si, KR;

Inventors:

Jaehyun Lee, Bucheon-si, KR;

Jiyun Moon, Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 32/194 (2017.01); C01B 32/19 (2017.01); C01G 39/06 (2006.01); C30B 33/00 (2006.01); C30B 29/46 (2006.01); C30B 29/64 (2006.01); C30B 29/02 (2006.01); B82Y 40/00 (2011.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
C01B 32/194 (2017.08); C01B 32/19 (2017.08); C01G 39/06 (2013.01); C30B 29/02 (2013.01); C30B 29/46 (2013.01); C30B 29/64 (2013.01); C30B 33/00 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C01B 2204/02 (2013.01);
Abstract

The present embodiments relate to a method for manufacturing a two-dimensional material using a top-down method, the method includes the steps of preparing a bulk crystal, forming a metal layer on the bulk crystal, and then attaching a thermal release tape on the metal layer, exfoliating a two-dimensional material to which the metal layer and the thermal release tape have been attached from the bulk crystal, transferring the two-dimensional material to which the metal layer and the thermal release tape have been attached onto a substrate, and removing the thermal release tape and the metal layer from the substrate onto which the two-dimensional material has been transferred.


Find Patent Forward Citations

Lee, Jaehyun. (2023). Method for manufacturing two-dimensional material using top-down method (U.S. Patent No. 11691880). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11691880

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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