The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2023

Filed:

Nov. 18, 2022
Applicant:

Aon Benfield Inc., Chicago, IL (US);

Inventor:

Takeshi Okazaki, Tokyo, JP;

Assignee:

Aon Benfield, Inc., Chicago, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06Q 40/00 (2023.01); G06F 18/241 (2023.01); G06N 20/20 (2019.01); G06T 7/00 (2017.01); G06N 3/08 (2023.01); G06V 10/46 (2022.01); G06V 20/13 (2022.01);
U.S. Cl.
CPC ...
G06F 18/241 (2023.01); G06N 3/08 (2013.01); G06N 20/20 (2019.01); G06T 7/0002 (2013.01); G06V 10/462 (2022.01); G06V 20/13 (2022.01);
Abstract

In an illustrative embodiment, methods and systems for automatically assessing damage vulnerability of a property include accessing digital images of a property parcel having a first structure thereon, classifying features visible in the images, including at least one feature of the first structure and at least one feature present in a neighborhood of the property parcel, to determine at least one of characteristic of each feature, determining a spatial relationship between a first structure and each manmade and/or natural feature represented by the classified features, and applying a property loss risk profile, based at least in part on the determined characteristics and the determined spatial relationships, to calculate a risk estimate for the first structure under at least one risk scenario.


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