The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2023

Filed:

May. 07, 2015
Applicant:

Basf Coatings Gmbh, Muenster, DE;

Inventors:

Maraike Ahlf, Schriesheim, DE;

Felix Eickemeyer, Heidelberg, DE;

Daniel Loeffler, Birkenheide, DE;

Stephan Klotz, Dornach, CH;

Juergen Frank, Ludwigshafen, DE;

Myung Mo Sung, Seoul, KR;

Kwan Hyuck Yoon, Seoul, KR;

Assignee:

BASF COATINGS GMBH, Muenster, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 28/00 (2006.01); B05D 1/00 (2006.01); C23C 16/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45529 (2013.01); B05D 1/60 (2013.01); C23C 16/0227 (2013.01); C23C 16/403 (2013.01); C23C 28/00 (2013.01);
Abstract

The present invention is in the field of processes for producing flexible organic-inorganic laminates as well as barrier films comprising flexible organic-inorganic laminates by atomic layer deposition. In particular the present invention relates to a process for producing a laminate comprising more than once the sequence comprising: (a) depositing an inorganic layer by performing 4 to 150 cycles of an atomic layer deposition process, and (b) depositing an organic layer comprising sulfur by a molecular layer deposition process.


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