The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2023

Filed:

Oct. 14, 2020
Applicant:

Sharp Kabushiki Kaisha, Sakai, JP;

Inventor:

Hidenobu Kimoto, Sakai, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1288 (2013.01); H01L 27/124 (2013.01); H01L 27/127 (2013.01); H01L 27/1251 (2013.01); H01L 29/78633 (2013.01);
Abstract

A method for manufacturing an active matrix substrate includes: (A) a step of forming a laminated film including a lower conductive film, a lower insulating film, and a semiconductor film in this order on a substrate; (B) a step of forming a first resist layer; (C) a step of performing a patterning on the laminated film, the step including, in the first formation region, forming the first substructure including a first lower conductive layer, a first lower insulating layer, and a first semiconductor layer respectively formed from the lower conductive film, the lower insulating film, and the semiconductor film, and (D) a step of forming source and drain electrodes electrically connected to the first semiconductor layer.


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