The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2023
Filed:
Dec. 06, 2021
Industrial Technology Research Institute, Hsinchu, TW;
Yu-Tai Li, Taichung, TW;
Kao-Chi Lin, Kaohsiung, TW;
Cho-Fan Hsieh, Yilan County, TW;
Teng-Chun Wu, Kinmen County, TW;
Cheng-Yu Peng, Taoyuan, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A measuring method includes the following. An image to be tested of an object to be tested with a first characteristic pattern is formed and is copied to form multiple images to be tested. The multiple images to be tested are superimposed to form a to-be-tested overlapped image which has the multiple first characteristic patterns. A reference image of a reference object with a second characteristic pattern is formed and is copied to form multiple reference images. The multiple reference images are superimposed to form a reference overlapped image which has the multiple second characteristic patterns. The to-be-tested overlapped image and the reference overlapped image are superimposed to generate a virtual moiré image having a moiré pattern different from the multiple first characteristic patterns and the multiple second characteristic patterns.