The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2023
Filed:
Feb. 11, 2019
Applicant:
Sumitomo Chemical Company, Limited, Tokyo, JP;
Inventors:
Assignee:
SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/038 (2006.01); C07D 407/12 (2006.01); C07D 407/14 (2006.01); C07D 407/08 (2006.01); G03F 7/16 (2006.01); C08G 61/02 (2006.01); C07C 309/06 (2006.01); C07D 305/06 (2006.01); C08L 33/14 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07D 407/12 (2013.01); C07D 407/14 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/168 (2013.01); C07C 309/06 (2013.01); C07D 305/06 (2013.01); C07D 407/08 (2013.01); C08G 61/025 (2013.01); C08L 33/14 (2013.01);
Abstract
The present invention can provide a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition. A resist composition comprising a resin including a structural unit having an acid-labile group, an acid generator and a compound represented by formula (I): wherein, in formula (I),