The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2023

Filed:

Aug. 20, 2018
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Tsutomu Terao, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B29C 43/58 (2006.01); B29C 59/02 (2006.01); B29L 31/34 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 43/58 (2013.01); B29C 2043/585 (2013.01); B29C 2043/5891 (2013.01); B29C 2059/023 (2013.01); B29L 2031/3425 (2013.01);
Abstract

An apparatus forms a pattern of an imprint material by curing the imprint material in a state in which the imprint material on a pattern formation region of a member, where a pattern is to be formed, is in contact with a pattern region of a mold. The apparatus includes a dispenser for placing the imprint material on the pattern formation region of the member and a non-pattern formation region of the member, outside the pattern formation region, a detector for detecting the non-pattern formation region in a state in which the imprint material has been placed on the pattern formation region and the non-pattern formation region by the dispenser, and a controller for performing processing for determining an abnormality in the dispenser based on a detection result of the non-pattern formation region by the detector.


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