The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2023
Filed:
Apr. 29, 2020
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventors:
Soo Young Park, Incheon, KR;
Ohyeol Kwon, Chungcheongnam-do, KR;
Jun Keon Ahn, Sejong-si, KR;
Jung Hwan Lee, Gyeonggi-do, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-Do, KR;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/042 (2014.01); B23K 26/03 (2006.01); B23K 26/08 (2014.01); H01L 21/02 (2006.01); H01L 21/68 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
B23K 26/042 (2015.10); B23K 26/032 (2013.01); B23K 26/0823 (2013.01); H01L 21/02021 (2013.01); H01L 21/681 (2013.01); H01L 22/12 (2013.01);
Abstract
Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a chamber providing a space in which a substrate is treated, a support unit supporting the substrate inside the chamber, a laser unit irradiating laser to an edge region of the substrate, a vision unit capturing the edge region of the substrate to measure an offset value of the substrate, and an adjustment unit adjusting an irradiation location of the laser based on the offset value of the substrate.