The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2023

Filed:

Jan. 25, 2017
Applicant:

Regents of the University of Minnesota, Minneapolis, MN (US);

Inventors:

Xiao Wu, Moscow, ID (US);

Shaobo Deng, Eden Prairie, MN (US);

Jun Zhu, Fayetteville, AR (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01); B01J 8/04 (2006.01); H05H 1/24 (2006.01); C10L 1/02 (2006.01); C07C 67/02 (2006.01);
U.S. Cl.
CPC ...
B01J 19/088 (2013.01); B01J 8/0453 (2013.01); B01J 19/087 (2013.01); C07C 67/02 (2013.01); C10L 1/026 (2013.01); H05H 1/2406 (2013.01); B01J 2219/0803 (2013.01); B01J 2219/083 (2013.01); B01J 2219/0809 (2013.01); B01J 2219/0811 (2013.01); B01J 2219/0815 (2013.01); B01J 2219/0824 (2013.01); B01J 2219/0828 (2013.01); B01J 2219/0869 (2013.01); B01J 2219/0877 (2013.01); B01J 2219/0888 (2013.01); B01J 2219/0892 (2013.01); B01J 2219/0894 (2013.01); H05H 1/246 (2021.05); H05H 1/2443 (2021.05); H05H 2245/15 (2021.05);
Abstract

A process comprises feeding a stream of reactant compounds to a reactor and discharging a liquid plasma into the reactant stream in the reactor, wherein the plasma initiates or accelerates a reaction of the reactant compounds to form a product composition. The reactor can comprise one or more chambers, a high-voltage electrode positioned at a first portion of the one or more chambers, a ground electrode positioned at a second portion of the one or more chambers, and a dielectric plate between the ground electrode and the high-voltage electrode that comprises openings through which the reactant stream can pass from the first portion to the second portion or from the second portion to the first portion. Discharging the plasma can include supplying electrical power to the high-voltage electrode such that plasma is discharged where the reactant stream flows through the openings.


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