The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2023
Filed:
Nov. 18, 2019
Applicant:
Stamford Devices Limited, Dangan, IE;
Inventor:
Brendan Hogan, Gort, IE;
Assignee:
Stamford Devices Limited, Galway, IE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61M 11/00 (2006.01); B05B 17/00 (2006.01); C25D 1/08 (2006.01); C25D 7/00 (2006.01); C25D 3/56 (2006.01);
U.S. Cl.
CPC ...
A61M 11/003 (2014.02); A61M 11/005 (2013.01); C25D 1/08 (2013.01); C25D 7/00 (2013.01); B05B 17/0646 (2013.01); C25D 3/567 (2013.01);
Abstract
A photo-resist () is applied in a pattern or vertical columns having the dimensions of holes or pores of the aperture plate to be produced. This mask pattern provides the apertures which define the aerosol particle size, having up to 2500 holes per square mm. There is electro-deposition of metal () into the spaces around the columns (). There is further application of a second photo-resist mask () of much larger (wider and taller) columns, encompassing the area of a number of first columns (). The hole diameter in the second plating layer is chosen according to a desired flow rate.